proximity effect correction

基本解释

Many different schemes have been devised to minimize the proximity effect, such as pattern size correction and dose modulation.
有多种方法对邻近效应进行修正如剂量调整、图形调整等。
By Fourier transform, produces a fast and accurate calculation for dose precompensation in proximity effect correction for electron beam lithography.
将付里叶变换法运用于电子束曝光的邻近效应校正中，形成了快速、准确的剂量校正法。
Furthermore, the parameters acquired by this method are successfully used for proximity effect correction in electron beam lithography on the same experimental conditions.
此外，用此方法提取的电子散射参数被成功地用于相同实验条件下的电子束临近效应校正。