negative ion source

基本解释

It was used to predict the beam optical performance of an extraction system for a surface-plasma bucket negative ion source.
对表面-等离子体型桶式负离子源引出系统束光学的性质进行了数值模拟。
The negative ion element will become the gas source center and form an ejection in the process of evaporation of coating material, so decrease the damage threshold of the coatings.
并且提出负离子元素在膜料蒸发过程中形成气源中心，产生喷溅，从而使薄膜的损伤阈值降低。
The plasma source ion implantation device consists of pulsed negative high voltage power, hot cathode arc discharge system, vacuum chamber and target stage, vacuum system and monitor system.
等离子体源离子注入装置由脉冲负高压源系统、热阴极弧放电系统、真空室及样品台、真空系统和监测系统等五部分组成。